Editorial board

Editors:

Professor George Jackson (Chairman) - Department of Chemical Engineering, Centre for Process Systems Engineering, Imperial College London, South Kensington Campus, London SW7 2AZ, UK

  Professor Martin Head-Gordon - Department of Chemistry, Room 419 Latimer Hall, University of California, Berkeley, CA 94720-1460, USA

  Professor Trygve Helgaker - Hylleraas Centre for Quantum Molecular Sciences, Department of Chemistry, University of Oslo, P.O.B. 1033 Blindern, N-0315 Norway

Professor Wenjian Liu - Qingdao Institute for Theoretical and Computational Sciences, Shandong University, Room 314, Building K1, Binhai 72, Jimo, Qingdao, Shandong 266237, P. R. China

Professor Andreas Osterwalder - Institute of Chemistry and Chemical Engineering (ISIC),  EPFL, 1015 Lausanne, Switzerland 

Advisory Board:

S. Ashbrook – University of St Andrews, UK
D. Frenkel - University of Cambridge, UK
A. Galindo - Imperial College London, UK
J. Gauss - University of Mainz, Germany
A. Gil-Villegas – University of Guanajuato, Mexico
C. McCabe – Heriot-Watt University, UK
F. Merkt - ETH Zurich, Switzerland
M. Quack - ETH Zürich, Switzerland
H. F. Schaefer III - University of Georgia at Athens, USA
P. Schwerdtfeger – Massey University, New Zealand
T. P. Softley - University of Birmingham, UK
C. Timmel - University of Oxford, UK
D. J. Tozer - University of Durham, UK
H.-J. Werner - University of Stuttgart, Germany
R. Wester – University of Innsbruck, Austria
S. Willitsch - University of Basel, Switzerland
J. Yeomans - University of Oxford, UK

Editorial Board:

F. Bresme - Imperial College London, UK
P. J. Camp - University of Edinburgh, UK
T. Carrington - Queen’s University, Canada
L. Cheng – Johns Hopkins University, USA
S. Coriani - University of Trieste, Italy
T. D. Crawford - Virginia Tech, USA
A. G. Császár - Eötvös University, Hungary
M. Dijkstra - Utrecht University, Netherlands
C. Domene - Bath University, UK
M. Ernst - ETH Zürich, Switzerland
M. D. Esrafili - University of Maragheh, Iran
J.-M. Flaud - LISAA, France
P. W. Fowler - University of Sheffield, UK
D. Ghosh – IACS, India
L. Gagliardi - University of Minnesota, USA
D. Goldfarb - Weizmann Institute, Israel
J. P. Hansen - University of Cambridge, UK
T. Head-Gordon - University of California, Berkeley, USA
M. Herman - Free University of Brussels, Belgium
P. J. Hore - University of Oxford, UK
P. Hunt - Imperial College London, UK
K. Ivanov - Russian Academy of Sciences, Russia
M. Jing - Fuzhou University, China
S. Kais - Purdue University, USA
M. Kallay - Budapest University of Technology and Economics, Hungary
W. Klopper - Karlsruhe Institute of Technology, Germany
D. Kofke - University at Buffalo, USA
E. Kraka - Southern Methodist University, USA
A. Krylov - University of Southern California, USA
S. Li - Nanjing University, China
W. Liang - Xiamen University, China
C. N. Likos - University of Vienna, Austria
R. Lindh - Uppsala University, Sweden
S. Luber – University of Zurich, Switzerland
H. Ma – Shandong University, China
S. Mackenzie - University of Oxford, UK
E. Matyus – Eotvos Lorand University, Hungary
S. van de Meerakker - Radboud University Nijmegen, Netherlands
C. Miqueu – Pau University, France
I. Nezbeda - Institute of Chemical Process Fundamentals, Czech Republic
C. Ochsenfeld - Ludwig Maximilian University of Munich, Germany
J. Orphal – Karlsruhe Institute of Technology, Germany
A. Z. Panagiotopoulos -Princeton University, USA
D. H. Parker - Institute for Molecules and Materials, Netherlands
K. Pernal – Lodz University of Technology, Poland
K. Reid - University of Nottingham, UK
R. Riek - ETH Zürich, Switzerland
B. Rotenberg - Sorbonne University, France
A. Savin - Sorbonne University, France
M. Schnell - Max Planck Institute, Germany
I Siepman – Minnesota University, USA
R. Signorell - ETH Zürich, Switzerland
A. K. Soper - Science and Technology Facilities Council, UK
J. F. Stanton - University of Florida, USA
V. Stavros – University of Warwick, UK
H.-J. Steinhoff - University of Osnabrueck, Germany
S. Stopkowicz – Saarland University, Germany
D. Sundholm - University of Helsinki, Finland
P. R. Taylor - Aarhus University, Denmark
M. Telo da Gama - University of Lisbon, Portugal
S. Ten-no - Kobe University, Japan
W. Ubachs - Vrije Universiteit Amsterdam, Netherlands
C. Vega - University Complutense of Madrid, Spain
N. B. Wilding - University of Bath, UK
X. Xu - Fudan University, China
K. Yamanouchi – University of Tokyo, Japan
R. N. Zare - Stanford University, USA
D. H. Zhang - Dalian Institute of Chemical Physics, China