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Research Article

Effect of SiO2 Addition to Highly Loaded Ni on CeO2 for CO2 Methanation

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Article: 2303309 | Received 20 Oct 2023, Accepted 04 Jan 2024, Published online: 21 Feb 2024
 

Abstract

In this study, 60 wt% Ni on xSiO2–(1 – x)CeO2 catalysts were prepared by flame spray pyrolysis, and the effects of SiO2 fraction (x = 0–0.2) on the material properties and catalytic activity of CO2 methanation were investigated. After reducing the catalysts in 5%H2−Ar at 500 °C, the catalytic activity was evaluated; the highest catalytic activity was exhibited at x = 0.05. Furthermore, SiO2 addition was found to improve the catalytic activity after 110 hours of the reaction. Powder X-ray diffraction revealed that SiO2 addition did not alter the crystallinity of the catalysts before and after the reduction. Conversely, the appropriate amount of SiO2 doping increased the Ni surface area and pore volume of the reduced catalysts, as confirmed by H2 chemisorption and N2 adsorption–desorption measurements. H2-TPR measurements showed an increasing trend in the reduction temperature of particulate NiO as the SiO2 fraction increased. The shift of the reduction temperatures indicates the better contact between NiO and SiO2, which hindered the sintering of Ni particles during the reduction at 500 °C. Therefore, an appropriate amount of SiO2 addition prevented the growth of Ni particles, resulting in the increase of the Ni surface area. The increase of the Ni surface area contributed to the improvement of the catalytic activity.

Disclosure statement

No potential conflict of interest was reported by the author(s).

Additional information

Funding

This study was supported by the tryout program (JPMJTM20BJ) of the Japan Science and Technology Agency and the research grant by the Information Center of Particle Technology, Japan. Electron microscopy measurements were supported by “ARIM Project of the Ministry of Education, Culture, Sports, Science and Technology, Japan (MEXT), Grant No. JPMXP1223OS0036” at the Research Center for Ultra-High Voltage Electron Microscopy (Nanotechnology Open Facilities) in Osaka University.