https://orcid.org/0000-0003-3275-300X
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Abstract
The results of complex experimental studies of the parameters of thin coatings of SiO2 oxides on Si, formed by thermal oxidation at temperatures of 1200 °C, including studies using electron and X-ray spectroscopy, IR-Fourier spectrometer IRTracer-100 - developed by Shimadzu, Raman scattering, and test electrophysical structures, are presented. Data have been obtained that for a silicon dioxide thickness of about 400 nm, the porosity of the coating does not exceed 2/cm2, and the electric field strength for the breakdown of the dioxide reaches 5·106 V/cm. The crystal structure of SiO2 is triclinic, lattice period a = 4.9160 Å, b = 4.9170 Å, c = 5.4070 Å, a = 90.000, b = 90.000, γ = 120.000, density 2.64 g/cm³.
Disclosure Statement
No potential conflict of interest was reported by the author(s).