Preparation of Aluminum-Based Porous Al₂O₃ Humidity-Sensitive Thin Film Sensors by Microarc Oxidation

Abstract

In order to improve the stability, and sensitivity and response speed of moisture-sensitive sensors, the microarc oxidation process is used to realize the preparation of porous Al₂O₃ structure humidity-sensitive thin films on aluminum substrate and combined with magnetron sputtering process to realize the preparation of the humidity-sensitive sensor. After the Al₂O₃ moisture-sensitive films are prepared by the mechanical polishing, the microarc oxidation process platform and aging processes, moisture-sensitive films will be characterized by XRD and SEM. The results show that the peak intensity of α-Al₂O₃ diffraction peaks in Al₂O₃ humidity-sensitive thin films can be enhanced by increasing the microarc oxidation current. By building the humidity device platform for humidity-sensitive testing, the change of ambient humidity will lead to different changes of resistance and capacitance of the films, and the moisture-sensitive devices have better sensitivity at a lower frequency of 100 Hz.

Keywords:

• Moisture-sensitive sensor
• microarc oxidation process
• porous Al₂O₃ structure

Disclosure Statement

No potential conflict of interest was reported by the author(s).