Effect of coating and plasma treatments on the induced coupled plasma-reactive ionic etching of boron-doped diamond for microelectromechanical systems (MEMS) applications

References

• Reay RJ, Flannery AF, Storment CW, Kounaves SP, Kovacs GTA. Microfabricated electrochemical analysis system for heavy metal detection. Sens Actuat B: Chem. 1996;34:450–455. doi: 10.1016/S0925-4005(97)80018-4
   Web of Science ®Google Scholar
• Choi JY, Seo K, Cho SR, Oh JR, Kahng SH, Park J. Screen-printed anodic stripping voltammetric sensor containing HgO for heavy metal analysis. Anal Chim Acta. 2001;443:241–247. doi: 10.1016/S0003-2670(01)01219-3
   Web of Science ®Google Scholar
• Zhu X, Gao C, Choi JW, Bishop PL, Ahn CH. On-chip generated mercury microelectrode for heavy metal ion detection. Lab Chip. 2005;5:212–217. doi: 10.1039/b410006a
   PubMed Web of Science ®Google Scholar
• Zou Z, Jang A, MacKnight E, Wu PM, Do J, Bishop PL, Ahn CH. Environmentally friendly disposable sensors with microfabricated on-chip planar bismuth electrode for in situ heavy metal ions measurement. Sens Actuat B Chem. 2008;134:18–24. doi: 10.1016/j.snb.2008.04.005
   Web of Science ®Google Scholar
• McGaw EA, Swain GM. A comparison of boron-doped diamond thin-film and Hg-coated glassy carbon electrodes for anodic stripping voltammetric determination of heavy metal ions in aqueous media. Anal Chim Acta. 2006;575: 180–189. doi: 10.1016/j.aca.2006.05.094
   PubMed Web of Science ®Google Scholar
• Madore C, Duret A, Haenni W, Perret A. Microfabricated systems and MEMS V: detection of trace silver and copper at an array of boron-doped diamond microdisk electrodes. New Jersey, NJ: The Elctrochemical Society; 2000. p. 159–168.
   Google Scholar
• Tsunozaki K, Einaga Y, Rao TN, Fujishima A. Fabrication and electrochemical characterization of boron-doped diamond microdisc array electrodes. Chem Lett. 2002;5:502–503. doi: 10.1246/cl.2002.502
   Web of Science ®Google Scholar
• Pagels M, Hall CE, Lawrence NS, Meredith A, Jones TGJ, Godfried HP, Pickles CSJ, Wilman J, Banks CE, Compton RG, Jiang L. All-diamond microelectrode array device. Anal Chem. 2005;77:3705–3708. doi: 10.1021/ac0502100
   PubMed Web of Science ®Google Scholar
• Silva F, Hassouni K, Bonnin X, Gicquel A. Microwave engineering of plasma-assisted CVD reactors for diamond deposition. J Phys: Condens Matter. 2009;21:364202-1–364202-16.
   Google Scholar
• Leech PW, Reeves GK, Holland AS. Reactive ion etching of diamond in CF4, O2, O2 and Ar mixtures. J Mater Sci. 2001;36:3453–3459. doi: 10.1023/A:1017964129419
   Web of Science ®Google Scholar
• Williams KR, Muller RS. Etch rates for micromachining processing. J Microelectromechanical Syst. 1996;5(4): 256–269. doi: 10.1109/84.546406
   Web of Science ®Google Scholar
• Lee JM, Chang KM, Kim SW, Huh C, Lee IH, Park SJ. Dry etch damage in n-type GaN and its recovery by treatment with an N2 plasma. J Appl Phys. 2000;87:7667–7670. doi: 10.1063/1.373438
   Web of Science ®Google Scholar
• Feng MS, Guo JD, Lu YM, Chang EY. Reactive ion etching of GaN with BCL3/SF6 plasmas. Mater Chem Phys. 1996;45:80–83. doi: 10.1016/0254-0584(96)80053-8
   Web of Science ®Google Scholar
• Jiang L, Plank NOV, Blauw MA, Cheung R, Drift EVD. Dry etching of SiC in inductively coupled Cl2/Ar plasma. J Phys D: Appl Phys. 2004;37:1809–1814. doi: 10.1088/0022-3727/37/13/012
   Web of Science ®Google Scholar
• Kuo Y. Plasma swelling of photoresist. Jpn J Appl Phys. 1993;32:L126–L128. doi: 10.1143/JJAP.32.L126
   Google Scholar
• Lanois F, Planson D, Locatelli M-L, Lassagne P, Jaussaud C, Chante J-P. Chemical contribution of oxygen to silicon carbide plasma etching kinetics in a distributed electron cyclotron resonance (DECR) reactor. J Electron Mater. 1999;28:219–224. doi: 10.1007/s11664-999-0017-y
   Web of Science ®Google Scholar
• Khan FA, Adesida I. High rate etching of SiC using inductively coupled plasma reactive ion etching in SF6-based gas mixtures. Appl Phys Lett. 1999;75:2268–2270. doi: 10.1063/1.124986
   Web of Science ®Google Scholar
• Ando Y, Nishibayashi Y, Kobashi K, Hirao T, Oura K. Smooth and high-rate reactive ion etching of diamond. Diam Relat Mat. 2002;11:824–827. doi: 10.1016/S0925-9635(01)00617-3
   Web of Science ®Google Scholar
• Pan WS, Steckl AJ. Reactive ion etching of SiC thin films by mixtures of fluorinated gases and oxygen. J Electrochem Soc. 1990;137:212–220. doi: 10.1149/1.2086368
   Web of Science ®Google Scholar
• Yih PH, Saxena V, Steckl AJ. A review of SiC reactive ion etching in fluorinated plasmas. Phys Status Solidi B. 1997;202:605–642. doi: 10.1002/1521-3951(199707)202:1<605::AID-PSSB605>3.0.CO;2-Y
   Google Scholar